Elaboration of the technology of novel photolithographic masks fabricated on sapphire substrates for UV and DUV application was described. The main technological steps of mask fabrication as Cr metallization deposition. selection of resist for lithography and Cr layer etching were developed and reported. The etching of Cr films was carried out through resist mask. https://lockdownsecuritycanada.shop/product-category/amplifier-installation-kit/